The structural characterisation of HWCVD-deposited nanocrystalline silicon films
نویسندگان
چکیده
منابع مشابه
Morphological, structural and photoresponse characterization of ZnO nanostructure films deposited on plasma etched silicon substrates
ZnO nanostructure films were deposited by radio frequency (RF) magnetron sputtering on etched silicon (100) substrates using dry Ar/SF6 plasma, at two etching times of 5 min and 30 min, and on non etched silicon surface. Energy dispersive X-ray (EDX) technique was employed to investigate the elements contents for etched substrates as well as ZnO films, where it is found to be stoichiometric. Su...
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ژورنال
عنوان ژورنال: South African Journal of Science
سال: 2009
ISSN: 1996-7489,0038-2353
DOI: 10.4102/sajs.v105i1/2.41